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Recently, the research team of Qin Yong of coal conversion at the Shanxi Institute of Coal Chemistry, Chinese Academy of Sciences, proposed a universal method
for achieving heterogeneous catalyst heterogeneity by using diffusion-limited atomic layer deposition (ALD).
The method constructs a hollow rivet structure by selectively depositing metal oxides at the orifice of mesoporous molecular sieve, which can be applied to the physical packaging of various homogeneous catalysts in the pores, and the encapsulated homogeneous catalyst can maintain or improve the activity and chiral catalytic selectivity of the homogeneous catalyst, and has ultra-high reusability
.
Compared with traditional covalently bonded solidified heterogeneous catalysts, nanoreactors can maintain the freedom and activity
of chiral complexes by encapsulating homogeneous catalysts in mesoporous or mesoporous zeolite channels by non-covalently bonded homogeneous catalysts.
ALD is an advanced thin film deposition technology, which has good application prospects
in the precise design of catalyst structure.
The research team applied the diffusion law of precursors in ALD in the pores of porous materials to encapsulate homogeneous catalysts in the pores of
mesoporous materials.
This method provides a simpler and more accurate method
for homogeneous catalyst multiphase.
This method has good universality, can be applied to the encapsulation of various complexes in various mesoporous molecular sieve pores, according to the size of the complex molecules and molecular sieve pore size, the process is simply adjusted to achieve encapsulation, and reusable efficient catalysts
are obtained.