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Vacuum coating is widely used, such as vacuum aluminum plating, vacuum plating on plastics and other substrates, and then dyeing treatment of different colors, which can be used in furniture, handicrafts, lighting, clocks, toys, automotive lamps, reflectors and flexible packaging materials and other products, the decorative effect is very good
.
Areas where vacuum coating technology is commonly used
(1) Application in hard coating: cutting tools, molds and wear-resistant and corrosion-resistant parts.
(2) Application in protective coating: aircraft engine blades, automotive steel plates, heat sinks, etc
.
(3) Application in the field of optical film: anti-reflection film, high reflection film, cut-off filter, anti-counterfeiting film, etc
.
(4) Applications in architectural glass: sunlight control film, low-emissivity glass, anti-fog and anti-dew and self-cleaning glass
.
(5) Application in the field of solar energy utilization: solar collector tubes, solar cells, etc
.
(6) Application in integrated circuit manufacturing: film resistors, film capacitors, film temperature sensors, etc
.
(7) Application in the field of information display: LCD screen, plasma screen, etc
.
(8) Application in the field of information storage: magnetic information storage, magneto-optical information storage, etc
.
(9) Application in decorative jewelry: mobile phone case, watch case, glasses frame, hardware, trinkets and other coatings
.
Advantages of vacuum coating technology
(1) Wide range of coating materials: There are dozens of evaporation materials that can be used as vacuum plating, including metals, alloys and non-metals
.
Vacuum coating processing can also process multi-layer structure composite film like multi-layer electroplating to meet the needs of various different properties of coating;
(2) Vacuum coating technology can realize coating that cannot form a coating by electrodeposition method: such as aluminum, titanium, zirconium and other coatings, and even ceramic and diamond coatings, which is very valuable;
(3) Excellent vacuum coating performance: the thickness of vacuum coating is much smaller than that of electroplating layer, but the coating has good friction and corrosion resistance, low porosity, and no hydrogen embrittlement, which can save a lot of metal materials compared to electroplating processing;
(3) Excellent environmental benefits: the vacuum coating processing equipment is simple, the floor space is small, the production environment is elegant and clean, there is no sewage discharge, and it will not cause harm
to the environment and operators.
Under the situation of paying attention to environmental protection and vigorously promoting cleaner production, vacuum coating technology can replace electroplating processing
in many aspects.
Classification of vacuum coating technology
The main categories of vacuum coatings are: evaporation coating, sputtering coating and ion coating
.
Evaporative coating
In a vacuum state, the target material in the evaporation container is heated so that its atoms or molecules escape and are deposited on the surface of the target object to form a solid film
.
According to the type of evaporation material and substrate, it can be divided into: heating resistance, electron beam, high frequency induction, laser and other heating methods
.
Evaporation materials include aluminum, lead, gold, silver, platinum, nickel and other metal materials and materials that can produce optical properties of thin films, mainly using SiO 2, TiO 2, ZrO 2, MgF 2 and other oxides and fluorides
。 In addition to metals, resin and glass can also be used for evaporation, and in recent years, even paper has become evaporable
.
Advantages and disadvantages
of evaporation coating: the equipment is simple and easy to operate; The rate of film formation is fast and the efficiency is high
.
Disadvantages: the thickness uniformity of the film is not easy to control, the evaporation container has the hidden danger of pollution, the process repeatability is not good, and the adhesion is not high
.
2
Sputter coating
Electrons collide with argon atoms in the process of accelerating their flight to the substrate under the action of the electric field, ionizing a large number of argon ions and electrons
.
Under the action of electric field, argon ions accelerate the bombardment of the target material, sputtering a large number of target atoms, which are deposited on the surface of the substrate to form a film
.
The secondary electrons are affected by the magnetic field and are bound to the plasma region of the target surface, and the secondary electrons make circular movements around the target surface under the action of the magnetic field, and constantly collide with argon atoms during the movement, ionizing a large number of argon ions to bombard the target
.
Magnetron sputtering targets
The materials of the target materials mainly include metal targets, metal oxide targets, etc
.
Processing
is based on the shape and size of the target mount.
Advantages and disadvantages of magnetron sputtering: good process repeatability, high film purity, uniform film thickness, and good
adhesion.
Disadvantages: The equipment structure is complex, and once the sputtering target penetrates, it will lead to the scrapping of the entire target, so the utilization rate of the target is low
.
3
Ion plating
The molecules of the evaporated substance are deposited on the solid surface after being hit by electrons, which is called ion plating
.
The evaporation source is connected to the anode, the workpiece is connected to the cathode, and when three to five thousand volts of high-voltage direct current is passed, a glow discharge
is generated between the evaporation source and the workpiece.
Since the vacuum hood is filled with inert argon, part of the argon is ionized under the action of the discharge electric field, thus forming a plasma dark area
around the cathode workpiece.
The positively charged argon ions are attracted by the negative high pressure of the cathode and violently bombard the surface of the workpiece, causing the particles and dirt on the surface of the workpiece to be splashed and thrown, so that the surface of the workpiece to be plated has been fully cleaned by ion bombardment
.
Subsequently, the AC power supply of the evaporation source is turned on, and the evaporated material particles melt and evaporate, enter the glow discharge zone and are ionized
.
The positively charged evaporated material ions, under the attraction of the cathode, rush to the workpiece together with argon ions, and when the evaporated material ions thrown on the surface of the workpiece exceed the number of lost ions, they gradually accumulate to form a coating layer firmly adhering to the surface of the workpiece
.
9.
The size of the insulation resistance value between the parts of the vacuum chamber connected to different potentials is according to 4, 4 and 6
in GB/T11164-1999.
10.
Other precautions
.
(2) Relative humidity: not more than 75%.
(3) Cooling water inlet temperature: not higher than 25 °C
.
(4) Cooling quality: urban tap water or equivalent quality water
.
(5) Power supply: 380V three-phase 50Hz or 220V single-phase 50Hz (depending on the needs of the electrical appliances used); Voltage fluctuation range: 342-399V or 198-231V; Frequency fluctuation range: 49-51Hz
.
(6) The pressure, temperature, consumption, etc.
of compressed air, liquid nitrogen, cold water, hot water, etc.
required by the equipment should be specified
in the product instruction manual.
(7) The surrounding environment of the equipment is clean, the air is clean, and there should be no dust or gas that causes corrosion on the surface of electrical appliances and other metal parts or conduction between metals
.
The development trend of vacuum coating technology
At present, the basis of computers and information technology is VLSI; But the basic building blocks of the next century will be nanoelectronic integrated circuits
.
It is the next generation of microelectronic devices and has its own theory, technology and materials
.
The main materials of existing microelectronic devices are crystal semiconductors
such as extremely pure silicon, germanium and arsenic.
Nanoelectronic devices may be made of organic or organic/inorganic composite crystal films as the main raw materials, which require higher purity and better structure
.
The clean environment of vacuum preparation has the potential to process and assemble the structures
required for nanoelectronic devices.
According to literature reports, vacuum coating technology can be used to prepare the flat substrate
required for the assembly of nanoelectronic devices.
Source: Paint Show & Surface Treatment
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.
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.
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